Product Details

The AMAT DIP15049105 is a precision ceramic insulator assembly and chamber insert, also known as a dielectric part, designed for Applied Materials semiconductor vacuum plasma processing chambers. It is mounted inside the reaction chamber to isolate high voltage plasma components from grounded chamber body, suppressing plasma arcing and electrical short circuit risk. This dielectric part maintains stable plasma condition during wafer etching and thin film deposition, ensuring consistent film uniformity and wafer processing yield. If insulator degradation or abnormal plasma discharge occurs, it will trigger equipment fault signals to protect silicon wafers and expensive chamber hardware. Optimized for semiconductor cleanroom and vacuum environment, this ceramic insulator adopts high-purity ceramic raw material with low outgassing and low particle property, resisting plasma bombardment and corrosion from reactive process gas under long continuous fab operation.

This chamber insert is manufactured by high-precision CNC machining with strict dimension tolerance control. Optimized surface finish reduces particle accumulation inside vacuum chamber. Standard mounting interface supports fast installation and replacement during chamber preventive maintenance. Every unit is inspected for dielectric strength and particle level before shipment. The working temperature range is -10℃~+120℃, suitable for AMAT vacuum plasma wafer processing platforms. This dielectric part is widely used for chamber overhaul, worn insulator replacement and plasma system maintenance. Replacing AMAT DIP15049105 can restore reliable electrical isolation of plasma chamber and reduce unexpected production downtime.

Specifications

Brand: AMAT (Applied Materials)

Model: DIP15049105

Product Type: Ceramic Insulator Assembly

Alias: Plasma Chamber Dielectric Insert

Material: High purity ceramic, low outgassing, plasma resistant

Feature: High dielectric strength, anti-erosion, vacuum & cleanroom grade

Function: Electrical isolation, plasma arc suppression

Operating Temperature:-10℃~+120℃

Application:Semiconductor manufacturing vacuum plasma processing chamber