Product Details

The AMAT 0190-08860 is a precision solenoid valve assembly and gas assembly, also known as a chamber part, designed for Applied Materials semiconductor wafer processing gas manifold systems. It receives digital control commands from VME control boards to realize fast gas path switching and on-off control for process gas and purge gas. This chamber part maintains stable gas delivery sequence during wafer etching, thin film deposition and chamber purging cycles. Reliable valve switching ensures the gas composition and flow parameters inside vacuum chamber match process recipes, directly improving wafer uniformity and yield. When abnormal valve operation is detected, the assembly feeds fault signals back to the host controller and triggers safety interlock to cut off gas supply and prevent chamber contamination and wafer damage. Optimized for semiconductor cleanroom environments, this solenoid valve assembly uses low outgassing and corrosion-resistant material, compatible with various inert and reactive process gases, capable of enduring long-term thermal cycling inside fab equipment.

This gas assembly adopts compact structure and excellent sealing performance, with standard mounting interface for quick replacement during gas circuit maintenance. Every unit passes helium leak test before delivery to eliminate leakage risk. The working temperature range is -10℃~+60℃, matching the operating environment of AMAT wafer processing tools. This chamber part is widely used for gas manifold overhaul, worn solenoid valve replacement and gas delivery system maintenance. Installing AMAT 0190-08860 can restore stable gas switching control and reduce unexpected production downtime.

Specifications

Brand: AMAT (Applied Materials)

Model: 0190-08860

Product Type: Pneumatic Solenoid Valve Assembly

Alias: Process Gas Valve, Gas Path Switching Component

Feature: Low outgassing, corrosion resistant, helium leak tested, fast response

Function: Gas pipeline on/off control, process gas switching

Media: Inert and reactive semiconductor process gas

Operating Temperature:-10℃~+60℃

Application:Semiconductor manufacturing vacuum chamber gas manifold system