Product Details

The AMAT 0190-35278 is a precision solenoid valve assembly and gas valve, also known as a pneumatic component, designed for Applied Materials semiconductor wafer processing gas delivery systems. It is installed on the gas manifold to control the on-off and switching of process gas and purge gas during wafer etching, thin film deposition and chamber purge cycles. This gas valve receives digital control signals from the VME control board to open or close gas pipelines, adjusting gas supply sequences to maintain process recipe parameters. Reliable valve switching ensures stable gas composition and flow inside the vacuum chamber, directly improving wafer process uniformity and yield. If abnormal valve operation is detected, the assembly will feed fault signals back to the main controller and activate safety interlock to cut off gas supply and prevent chamber contamination and wafer scrap. Optimized for semiconductor cleanroom and vacuum environments, this pneumatic component adopts corrosion-resistant and low outgassing materials, compatible with many reactive and inert process gases, and can withstand long-term thermal cycling inside fab equipment.

This solenoid valve assembly has compact structure with excellent sealing performance. It uses standard mounting interface for convenient installation and replacement during gas loop maintenance. Each unit is helium leak tested before delivery to avoid gas leakage risk. Built-in fast response actuator ensures quick valve opening and closing. The working temperature range is -10℃ to +60℃, matching the operating environment of AMAT wafer fabrication tools. This gas valve is widely used for gas circuit overhaul, worn solenoid valve replacement and gas delivery system maintenance. Replacing AMAT 0190-35278 can restore stable gas switching control and reduce unexpected production downtime.

Specifications

Brand: AMAT (Applied Materials)

Model: 0190-35278

Product Type: Solenoid Valve Assembly

Alias: Gas Valve, Pneumatic Gas Component

Feature: Low outgassing, corrosion resistant, helium leak tested, fast response

Function: Process gas on/off control, gas path switching

Media: Inert and reactive semiconductor process gas

Operating Temperature:-10℃~+60℃

Application:Semiconductor manufacturing equipment gas manifold system